Numéro
J. Phys. Colloques
Volume 50, Numéro C6, Juin 1989
Beam Injection Assessment of Defects in Semiconductors
International Workshop
Page(s) C6-156 - C6-156
DOI https://doi.org/10.1051/jphyscol:1989616
Beam Injection Assessment of Defects in Semiconductors
International Workshop

J. Phys. Colloques 50 (1989) C6-156-C6-156

DOI: 10.1051/jphyscol:1989616

SEM/EBIC STUDY OF ELECTRICAL PROPERTIES IN BULK AND AT GRAIN BOUNDARIES IN Sb-DOPED GERMANIUM

N. TABET1 et C. MONTY2

1  Laboratoire de Physique des Solides, Université de Constantine, Algeria
2  Laboratoire de Physique des Matériaux, CNRS, F-92195 Meudon, France


Abstract
SEM/EBIC technique has been used recently to investigate both bulk and grain boundaries (GBs) electrical properties in germanium polycrystals [l]. In this work, the minority carrier diffusion length has been deduced from Schottky contact efficiency measurements using an original model taking into account the recombination of electronic carriers at the metal-germanium interface [2]. The EBIC observation of GBs shows three different behaviours : i) active suboundaries, ii) inactive suboundaries and iii) inactive highly misoriented grain boundaries. These defects have been characterized from a structural point of view using X-Ray topography (Berg Barrett) and ECP (Electron Channeling Pattern).