J. Phys. Colloques
Volume 42, Numéro C4, Octobre 1981Proceedings of the Ninth International Conference on Amorphous and Liquid Semiconductors
|Page(s)||C4-787 - C4-790|
J. Phys. Colloques 42 (1981) C4-787-C4-790
CHEMICAL SITES OF RARE GAS ATOMS IN AMORPHOUS SILICONY. Katayama, T. Shimada, K. Usami and E. Maruyama
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan
The chemical sites of the neon atoms imbedded in hydrogenated amorphous silicon a-Si : H that is produced using Ne as a sputtering agent are examined using X-ray photoelectron spectroscopy (XPS). From the behaviour of the XPS spectra in the Ne KLL Auger energy region, it is revealed that the Ne atoms incorporated in a-Si : H are imbedded in three kinds of sites, i. e., in sites closely surrounded by Si atoms, in sites adjacent to incorporated hydrogen atoms, and in microvoids.