Numéro
J. Phys. Colloques
Volume 47, Numéro C8, Décembre 1986
EXAFS and Near Edge Structure IV
Page(s) C8-63 - C8-66
DOI https://doi.org/10.1051/jphyscol:1986809
EXAFS and Near Edge Structure IV

J. Phys. Colloques 47 (1986) C8-63-C8-66

DOI: 10.1051/jphyscol:1986809

SPHERICAL WAVE ANALYSIS AND MULTIPLE SCATTERING EFFECTS IN HYDROGENATED AMORPHOUS SILICON

A. BALERNA1, M. BENFATTO1, S. MOBILIO1, C.R. NATOLI1, A. FILIPPONI2 et F. EVANGELISTI2

1  I.N.F.N., Laboratori Nazionali di Frascati, C.P. 13, I-00044 Frascati, Italy
2  Dipartimento di Fisica, Università "La Sapienza", I-00185 Roma, Italy


Abstract
We have performed a spherical wave analysis of the EXAFS spectra of hydrogenated amorphous silicon in order to detect contributions due to the next nearest neighbor scattering and/or multiple scattering. A high frequency oscillation was found that could be interpreted in terms of a second-shell contribution without multiple scattering effects. A feature which could not be explained in the one-electron scheme was identified and tentatively attributed to a many-electron effect.