| Numéro |
J. Phys. Colloques
Volume 41, Numéro C8, Août 1980
Fourth International Conference on Liquid and Amorphous Metals
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|---|---|---|
| Page(s) | C8-477 - C8-480 | |
| DOI | https://doi.org/10.1051/jphyscol:19808119 | |
J. Phys. Colloques 41 (1980) C8-477-C8-480
DOI: 10.1051/jphyscol:19808119
ELECTRICAL TRANSPORT AND STABILITY OF TMxSn1-x AMORPHOUS ALLOYS (TM = Fe, Co, Ni)
G. Marchal, J.F. Geny, Ph. Mangin et Chr. JanotLaboratoire de Physique du Solide (LA 155) Faculté des Sciences, C.O. 140, 54037 Nancy Cedex, France
Abstract
Availability of TMxSn1-x amorphous alloys (TM = Fe, Co, Ni) have been studied in relation with resistivity measurements. These alloys have been found mostly stable in composition ranges corresponding to negative values of the resistivity measurements. These alloys have been found mostly stable in composition ranges corresponding to negative values of the resistivity temperature coefficient α and whose wideness is maximum for the alloy with the largest single-site t matrix for scattering of electrons. However the crystallization temperature is not simply related to α and roughly follows the liquidus curve of the equilibrium phase diagrams in which the existence of a number of intermetallic compounds seems to be a stability factor for the corresponding amorphous system.