Numéro
J. Phys. Colloques
Volume 51, Numéro C1, Janvier 1990
Proceeding of the International Congress
Intergranular and Interphase Boundaries in materials
Page(s) C1-489 - C1-494
DOI https://doi.org/10.1051/jphyscol:1990176
J. Phys. Colloques 51, C1-489-C1-494 (1990)
DOI: 10.1051/jphyscol:1990176

MISORIENTATION DEPENDENCE OF DIFFUSION INDUCED GRAIN BOUNDARY MIGRATION (DIGM) IN ORIENTED Cu (Zn) BICRYSTALS

B. GIAKUPIAN1, R. SCHMELZLE1, W. GUST1 et R.A. FOURNELLE2

1  Max-Planck-Institut für Metallforschung and Institut für Metallkunde, Seestrasse 75, D-7000 Stuttgart 1, F.R.G.
2  Department of Mechanical Engineering, Marquette University, Milwaukee, WI 53233, U.S.A.


Abstract
Diffusion induced grain boundary migration (DIGM) has been studied in the Cu(Zn) system using Cu bicrystals with initially symmetrical tilt grain boundaries (GBs) of the <011> {011} type produced by diffusion bonding. The misorientation has been varied systematically over the range from 10.1 to 171.9°. Measurements of the GB velocity showed it to have a strong dependence on the misorientation angle. The morphology of DIGM has been studied by optical microscopy. As a special morphological phenomenon, faceting has been investigated at a symmetrical Σ 19a/26.52° <011> {011} GB.