| Issue |
J. Phys. Colloques
Volume 50, Number C5, Mai 1989
Actes de la 7ème Conférence Européenne sur les Dépôts Chimiques en Phase Gazeuse / Proceedings of the Seventh European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C5-779 - C5-779 | |
| DOI | https://doi.org/10.1051/jphyscol:1989594 | |
Actes de la 7ème Conférence Européenne sur les Dépôts Chimiques en Phase Gazeuse / Proceedings of the Seventh European Conference on Chemical Vapour Deposition
J. Phys. Colloques 50 (1989) C5-779-C5-779
DOI: 10.1051/jphyscol:1989594
1 Department of Chemistry and Applied Chemistry, University of Salford, GB-Salford M5 4WT, Great-Britain
2 Department of Physical Chemistry, University of Science and Technology, Beijing 100083, China
3 Materials Development Division, Harwell Laboratories, Harwell, GB-Oxon, Great-Britain
J. Phys. Colloques 50 (1989) C5-779-C5-779
DOI: 10.1051/jphyscol:1989594
MOCVD AND PLASMA MOCVD OF METAL OXIDE FILMS
P.S. WEGLICKI1, Z. CAO2, N.W. SKILLEN1, J.R. OWEN1 et P.T. MOSELEY31 Department of Chemistry and Applied Chemistry, University of Salford, GB-Salford M5 4WT, Great-Britain
2 Department of Physical Chemistry, University of Science and Technology, Beijing 100083, China
3 Materials Development Division, Harwell Laboratories, Harwell, GB-Oxon, Great-Britain
Without abstract
First page of the article
