| Issue |
J. Phys. Colloques
Volume 49, Number C6, Novembre 1988
35th International Field Emission Symposium / 35éme Symposium International d'Emission de Champ
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| Page(s) | C6-25 - C6-30 | |
| DOI | https://doi.org/10.1051/jphyscol:1988605 | |
35th International Field Emission Symposium / 35éme Symposium International d'Emission de Champ
J. Phys. Colloques 49 (1988) C6-25-C6-30
DOI: 10.1051/jphyscol:1988605
Department of Metallurgy and Science of Materials, University of Oxford, Parks Road, GB-Oxford OX1 3PH, Great-Britain
J. Phys. Colloques 49 (1988) C6-25-C6-30
DOI: 10.1051/jphyscol:1988605
DEVELOPMENT AND INITIAL APPLICATIONS OF A POSITION-SENSITIVE ATOM PROBE
A. CEREZO, T.J. GODFREY et G.D.W. SMITHDepartment of Metallurgy and Science of Materials, University of Oxford, Parks Road, GB-Oxford OX1 3PH, Great-Britain
Abstract
A position-sensitive detector system has been combined with a short flight-path atom probe to yield an instrument of large collection angle which identifies both the chemical nature and position of field evaporated ions. This allows the distribution of all elements to be mapped out simultaneously and, with depth profiling, permits three-dimensional reconstruction of the original compositional variations. Applications of the technique to the study of ordering, fine-scale precipitation and spinodal decomposition in metallic specimens are described, together with examples of the analysis of surface films in ceramic oxide superconductors, and interfaces in semiconductor materials.