Numéro
J. Phys. Colloques
Volume 48, Numéro C6, Novembre 1987
34th International Field Emission Symposium / 34ème Symposium International d'Emission de Champ
Page(s) C6-53 - C6-58
DOI https://doi.org/10.1051/jphyscol:1987609
34th International Field Emission Symposium / 34ème Symposium International d'Emission de Champ

J. Phys. Colloques 48 (1987) C6-53-C6-58

DOI: 10.1051/jphyscol:1987609

HIGH TEMPERATURE SEQUENCE IMAGES OF FIELD ION MICROSCOPY

M. Doyama1, K. Ishimoto2, T. Nishida3, M. Obara4, Y. Suzuki2 et S. Tanigawa5

1  Department of Iron and Steel Engineering, Faculty of Engineering, Nagoya University, Furocho, Chikusaku, Nagoya 464 JAPAN
2  Department of Metallurgy and Materials Science, Faculty of Engineering, The University of Tokyo, Hongo, Bunkyoku, Tokyo 113 Japan
3  Hitachi Central Research Laboratory, Kokubunjishi, Tokyo 185 JAPAN
4  Research and Development Center, Toshiba Corporation, Kawasaki Kanagawa 210
5  Materials Engineering, Tsukuba University, Tennoudai, Ibaragi 305


Abstract
Atomistic sequence images of high temperature field ion microscopy are presented for copper and aluminum specimens. A possible mechanism is proposed. The images are formed by the specimen self atoms. These self atoms are ionized when they climb up the atomic steps on the surface.