Numéro |
J. Phys. Colloques
Volume 45, Numéro C9, Décembre 1984
31st International Field Emission Symposium / 31ème Symposium International d'Emission de Champ
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Page(s) | C9-207 - C9-209 | |
DOI | https://doi.org/10.1051/jphyscol:1984934 |
31st International Field Emission Symposium / 31ème Symposium International d'Emission de Champ
J. Phys. Colloques 45 (1984) C9-207-C9-209
DOI: 10.1051/jphyscol:1984934
1 VG Scientific Limited, The Birches Industrial Estate, Imberhorne Lane, East Grinstead, Sussex, RH19 1UB, U.K.
2 Department of Metallurgy and Science of Materials, Oxford University, Parks Road, Oxford OX1 3PH, U.K.
J. Phys. Colloques 45 (1984) C9-207-C9-209
DOI: 10.1051/jphyscol:1984934
IN SITU ION MILLING OF FIELD ION SPECIMENS USING A LIQUID METAL ION SOURCE
A.R. Waugh1, S. Payne2, G.M. Worrall2 et G.D.W. Smith21 VG Scientific Limited, The Birches Industrial Estate, Imberhorne Lane, East Grinstead, Sussex, RH19 1UB, U.K.
2 Department of Metallurgy and Science of Materials, Oxford University, Parks Road, Oxford OX1 3PH, U.K.
Résumé
Un processus d'érosion ionique contrôlée est décrit. Il permet des applications intéressantes telles que le "déplacement" d'un joint de grain en direction de la zone imagée à l'apex d'un échantillon de microscopie ionique de champ.
Abstract
A controlled ion milling procedure is described which permits a feature of interest, such as a grain boundary to be brought towards the imaging region at the apex of a field ion specimen.