Supplément au Journal de Physique Colloques

COMPORTEMENT PHYSICO-CHIMIQUE DE Si₃N₄ OBTENU PAR LPCVD SOUMIS A DES FLUX RADIATIFS INTENSES

A. WANG, D. THENEGAL, C. ROYERE, C. DUPUY and B. ARMAS

J. Phys. Colloques, 50 C5 (1989) C5-353-C5-362

DOI: 10.1051/jphyscol:1989542

A. WANG

D. THENEGAL

C. ROYERE

C. DUPUY

B. ARMAS

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