Supplément au Journal de Physique Colloques

INFLUENCE OF HYDROGEN PARTIAL PRESSURE ON DEPOSITION AND PROPERTIES OF SPUTTERED AMORPHOUS GALLIUM ARSENIDE

L. Alimoussa, H. Carchano and J.P. Thomas

J. Phys. Colloques, 42 C4 (1981) C4-683-C4-686

DOI: 10.1051/jphyscol:19814151

L. Alimoussa

H. Carchano

J.P. Thomas

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