| Numéro |
J. Phys. Colloques
Volume 50, Numéro C5, Mai 1989
Actes de la 7ème Conférence Européenne sur les Dépôts Chimiques en Phase Gazeuse / Proceedings of the Seventh European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C5-565 - C5-565 | |
| DOI | https://doi.org/10.1051/jphyscol:1989566 | |
Actes de la 7ème Conférence Européenne sur les Dépôts Chimiques en Phase Gazeuse / Proceedings of the Seventh European Conference on Chemical Vapour Deposition
J. Phys. Colloques 50 (1989) C5-565-C5-565
DOI: 10.1051/jphyscol:1989566
1 Central Laboratory of Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, Sofia, Bulgaria
2 Nadjakov Institute of Solid State Physics, Bulgarian Academy of Sciences, Sofia, Bulgaria
J. Phys. Colloques 50 (1989) C5-565-C5-565
DOI: 10.1051/jphyscol:1989566
DEPOSITION AND STUDY OF CARBONYL CVD-W THIN FILMS
K.A. GESHEVA1 et G.S. BESHKOV21 Central Laboratory of Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, Sofia, Bulgaria
2 Nadjakov Institute of Solid State Physics, Bulgarian Academy of Sciences, Sofia, Bulgaria
Abstract
CVD - tungsten thin films are deposited using different technological parameters. As-deposited films are rich of carbon, oxygen as well as of nitrogen. Partially annealed in H2 atmosphere, these films exhibit solar selective properties - high absorptance in the visible coupled with high reflectance in the IR. Fully annealed, the films are almost pure W with low resistivity, assuring good transport properties for the purposes of VLSI applications.