| Numéro |
J. Phys. Colloques
Volume 49, Numéro C8, Décembre 1988
Proceedings of the International Conference on Magnetism
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|---|---|---|
| Page(s) | C8-1987 - C8-1988 | |
| DOI | https://doi.org/10.1051/jphyscol:19888901 | |
Proceedings of the International Conference on Magnetism
J. Phys. Colloques 49 (1988) C8-1987-C8-1988
DOI: 10.1051/jphyscol:19888901
Department of Physical Electronics, Tokyo Institute of TechnoIogy, 2-12-1, O-okayama, Meguro-ku, Tokyo 152, Japan
J. Phys. Colloques 49 (1988) C8-1987-C8-1988
DOI: 10.1051/jphyscol:19888901
THE THICKNESS DEPENDENCE OF M-H CHARACTERISTICS OF Co-Cr FILMS PREPARED BY FACING TARGETS SPUTTERING
S. Nakagawa, Y. Kitamoto et M. NaoeDepartment of Physical Electronics, Tokyo Institute of TechnoIogy, 2-12-1, O-okayama, Meguro-ku, Tokyo 152, Japan
Abstract
Co-Cr thin film with c-axis well-oriented initial layer can be prepared by using Facing Targets Sputtering system. Large squareness on in-plane hysteresis loop of them may be attributed to high term of anisotropy constant and the in-plane components of magnetization in domain walls.