| Numéro |
J. Phys. Colloques
Volume 49, Numéro C8, Décembre 1988
Proceedings of the International Conference on Magnetism
|
|
|---|---|---|
| Page(s) | C8-1789 - C8-1790 | |
| DOI | https://doi.org/10.1051/jphyscol:19888816 | |
Proceedings of the International Conference on Magnetism
J. Phys. Colloques 49 (1988) C8-1789-C8-1790
DOI: 10.1051/jphyscol:19888816
1 Dpto. de Física, Universidad de Oviedo, 33007, Oviedo, Spain
2 Lab. L. Néel, CNRS, 166X, 38042 Grenoble Cedex, France
3 Fac. de Física, Univ. de Barcelone, 08028, Barcelona, Spain
J. Phys. Colloques 49 (1988) C8-1789-C8-1790
DOI: 10.1051/jphyscol:19888816
SHORT RANGE ORDER IN ANNEALED FexSi1-x AMORPHOUS FILMS
J. M. Alameda1, J. F. Fuertes1, D. Givord2, A. Liènard2, B. Martínez3, M. A. Moreu3 et J. Tejada31 Dpto. de Física, Universidad de Oviedo, 33007, Oviedo, Spain
2 Lab. L. Néel, CNRS, 166X, 38042 Grenoble Cedex, France
3 Fac. de Física, Univ. de Barcelone, 08028, Barcelona, Spain
Abstract
Magnetic properties of as-prepared (sputtered) and annealed FexSi1-x (0.64 ≤ x ≤ 0.78) amorphous films deposited at room temperature, are interpreted in terms of chemical short-range order and compared with evaporated films deposited at 77 K. Low temperature (≤ 30 K) magnetization behaviour follows ; M (T) / M (0) = 1 - BT3/2 - CT5/2 with B = 1.5 x 10-2 K-3/2 ; C = -2.610 x-4 K-5/2. Related spin wave stiffness constant is D = 0.9 meV Å2.