| Numéro |
J. Phys. Colloques
Volume 49, Numéro C8, Décembre 1988
Proceedings of the International Conference on Magnetism
|
|
|---|---|---|
| Page(s) | C8-1787 - C8-1788 | |
| DOI | https://doi.org/10.1051/jphyscol:19888815 | |
Proceedings of the International Conference on Magnetism
J. Phys. Colloques 49 (1988) C8-1787-C8-1788
DOI: 10.1051/jphyscol:19888815
1 Depto. Física de Materiales, Facultad Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain
2 Institut de Ciencia de Materials C.S.I.C., 08028 Barcelona, Spain
3 Facultad de Física, Universidad de Barcelona, Diagonal 647.08028 Barcelona, Spain
J. Phys. Colloques 49 (1988) C8-1787-C8-1788
DOI: 10.1051/jphyscol:19888815
MAGNETIC PROPERTIES OF Ni/Si MULTILAYERS
M. T. Pérez-Frías1, B. Martínez2, M. A. Moreu3, J. Tejada3 et J. L. Vicent11 Depto. Física de Materiales, Facultad Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain
2 Institut de Ciencia de Materials C.S.I.C., 08028 Barcelona, Spain
3 Facultad de Física, Universidad de Barcelona, Diagonal 647.08028 Barcelona, Spain
Abstract
Multilayers of Ni/Si have been fabricated by D.C. triode sputtering. X-ray diffraction patterns were made in the reflection geometry. The diffraction patterns show peaks at small angles. High angle diffraction does not show any texture in Ni and Si layers. The dependence of magnetization with the temperature and the applied magnetic field is studied.