Numéro |
J. Phys. Colloques
Volume 49, Numéro C6, Novembre 1988
35th International Field Emission Symposium / 35éme Symposium International d'Emission de Champ
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Page(s) | C6-453 - C6-458 | |
DOI | https://doi.org/10.1051/jphyscol:1988677 |
J. Phys. Colloques 49 (1988) C6-453-C6-458
DOI: 10.1051/jphyscol:1988677
COMBINED FIELD ION AND FIELD ELECTRON EMISSION MICROSCOPY AND ENERGY-RESOLVED ATOM-PROBE SPECTROSCOPY OF Y Ba2 Cu3 O7-x
N. ERNST1, G. BOZDECH1 et A.J. MELMED21 Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-1000 Berlin 33, F.R.G.
2 National Bureau of Standards, Gaithersburg, MD 20899, U.S.A.
Abstract
Field electron emission patterns of Y Ba2 Cu3 O7-x, obtained under UHV conditions (<1·10-10 Torr), between 78 K and 200 K are spatially correlated with features observed by argon-FIM at surfaces prepared by field evaporation. Fowler-Nordheim plots of local and total i-V data taken at 78 K, i.e. 14 K below Tc, display a straight-line behavior, at least up to total electron currents of 10 nA. Increasing the tip-temperature from 78 K to 150 K has no measurable effect on the local field electron emission current, which originates from the vicinity of a prominent facet identified as a region of enhanced emission. Above 150 K, an increase of the field electron emission current is measured, involving a hysteresis-like behavior as the temperature it decreased. Retarding-potential analysis of 40Ar+ reveals a shift to larger energy deficits with increasing argon pressure, ranging between 5 eV and 10 eV above the energy deficit measured for W. This result possibly indicates a considerable penetration of the applied electric field into the near-surface layers under Ar-FIM conditions at 78 K.