Numéro
J. Phys. Colloques
Volume 48, Numéro C9, Décembre 1987
X-Ray and Inner-Shell Processes
Vol. 1
Page(s) C9-1025 - C9-1028
DOI https://doi.org/10.1051/jphyscol:19879184
X-Ray and Inner-Shell Processes
Vol. 1

J. Phys. Colloques 48 (1987) C9-1025-C9-1028

DOI: 10.1051/jphyscol:19879184

BONDS IN AMORPHOUS Nb1-xSix STUDIED BY X-RAY EMISSION AND X-RAY PHOTOELECTRON SPECTROSCOPY

W. ZAHOROWSKI1, 2, A. SIMUNEK1, 3, G. WIECH1, K. SÖLDNER4, R . KNAUF4 and SAEMANN- ISCHENKO4

1  Sektion Physik, Ludwig-Maximilians Universität München. D-8000 München 22, F.R.G.
2  Institute of Physics, Polish Academy of Sciences, Al. Lothikow 32/46. PL-02 668 Warsaw, Poland
3  Institute of Physics, Czechoslovak Academy of Sciences, 18040 Prague, Czechoslovakia
4  Physikalisches Institut,Universität Erlangen-Nürnberg, D-8520 Erlangen, F.R.G.


Abstract
X-ray emission bands (Si K, Si L, Nb Lβ2) and XPS spectra of amorphous a-Nb1-xSix (x=0.20, 0.80), cryst. silicon, a-Si and NbSi2 were combined to identify the origin of al1 their spectral features. The results show that the strength of Si3p-Nb4d mixing is stable and the p-d states account for the bond in the Nb-Si alloys. The Si-Nb bonds seem to be similar in Nb1-x Six and NbSi2 and invariable within a wide range of x.