| Numéro |
J. Phys. Colloques
Volume 48, Numéro C6, Novembre 1987
34th International Field Emission Symposium / 34ème Symposium International d'Emission de Champ
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|---|---|---|
| Page(s) | C6-487 - C6-492 | |
| DOI | https://doi.org/10.1051/jphyscol:1987680 | |
34th International Field Emission Symposium / 34ème Symposium International d'Emission de Champ
J. Phys. Colloques 48 (1987) C6-487-C6-492
DOI: 10.1051/jphyscol:1987680
1 Department of Physics, The Huazhong Normal University, Wuhan, Hubei, The People's Republic of China
2 Physics Department, The Pennsylvania State University, University Park, PA 16802, U.S.A.
J. Phys. Colloques 48 (1987) C6-487-C6-492
DOI: 10.1051/jphyscol:1987680
CHEMISORPTION OF CO AND METHANATION ON Rh SURFACES AT LOW TEMPERATURE AND LOW PRESSURE, AN ATOM-PROBE FIM STUDY
W. Liu1, D.M. Ren2, C.L. Bao2 et T.T. Tsong21 Department of Physics, The Huazhong Normal University, Wuhan, Hubei, The People's Republic of China
2 Physics Department, The Pennsylvania State University, University Park, PA 16802, U.S.A.
Abstract
Pulsed-laser imaging atom-probe and high resolution voltage pulsed atom-probe were employed to study the chemisorption behavior of CO on rhodium surfaces at low temperature and low pressure. The results are consistent and interesting. Our results support dissociative chemisorption on stepped surfaces of Rh and the effect of the surface structures. We also carried out methanation on Rh surfaces under adverse conditions and identified the intermediates of methanation with an isotope exchange technique. Our results led us to conclude that a dissociative mechanism is responsible for methanation on Rh surfaces under the condition of our experiment.