J. Phys. Colloques
Volume 47, Numéro C2, Mars 198632 nd International Field Emission Symposium / 32ème Symposium International d'Emission de Champ
|Page(s)||C2-107 - C2-114|
J. Phys. Colloques 47 (1986) C2-107-C2-114
CONICAL EQUIPOTENTIAL SUBSTRATE FOR LIQUID METAL SOURCESJ.A. KUBBY1, 2 et B.M. SIEGEL1, 3
1 School of Applied and Engineering Physics and The National Research
2 Resource Facility for Submicron Structures, Cornell University, Ithaca, NY 14853, U.S.A.
3 Resource Facility for Submicron Structures, Cornell University, Ithaca, NY 14853, U.S.A.
Morphological changes that occur at an ion bombarded surface as a result of erosion by sputtering can be utilized for the machining of cylindrically symmetric submicron structures. Such structuring has produced tungsten field emitters of conical configuration with variable cone half angle. A conical equipotential surface with an included half angle of 49.3° would be a useful emitter substrate for experiments designed to produce an equilibrium conical interface to a conducting fluid in an applied electric field. Taylor used a similar structure to support a Taylor cone so that the electric field near the cone could have the proper distribution when, and if, the fluid surface assumed a conical form.