Supplément au Journal de Physique Colloques

IN SITU PROCESSING OF InP BY FLASH LPCVD FOR SURFACE PREPARATION AND GATE OXIDE DEPOSITION

Y.I. NISSIM, C. LICOPPE, J.M. MOISON and C. MERIADEC

J. Phys. Colloques, 49 C4 (1988) C4-213-C4-215

DOI: 10.1051/jphyscol:1988444

Y.I. NISSIM

C. LICOPPE

J.M. MOISON

C. MERIADEC

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