Supplément au Journal de Physique Colloques

PARAMETERS CONTROLLING THE DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE SILICON IN Si/H DISCHARGE PLASMAS

S. vepŸek, Z. Iqbal, H.R. Oswald, F.A. Sarott and J.J. Wagner

J. Phys. Colloques, 42 C4 (1981) C4-251-C4-255

DOI: 10.1051/jphyscol:1981453

S. vepŸek

Z. Iqbal

H.R. Oswald

F.A. Sarott

J.J. Wagner

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