Supplément au Journal de Physique Colloques

CO₂-LASER ANNEALING OF BURIED LAYERS PRODUCED BY MEV ION IMPLANTATION

H. Boroffka, E.F. Krimmel, H. Runge and R. Langfeld

J. Phys. Colloques, 41 C4 (1980) C4-47-C4-49

DOI: 10.1051/jphyscol:1980408

H. Boroffka

E.F. Krimmel

H. Runge

R. Langfeld

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