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Cited article:

ON THE GROWTH FROM THE AMORPHOUS PHASE IN SEMICONDUCTORS

J.C. Bourgoin, R. Asomoza

J. Phys. Colloques, 44 C5 (1983) C5-175-C5-177

DOI: https://doi.org/10.1051/jphyscol:1983527

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This article has been cited by the following article(s):

Rapid thermal annealing‐induced epitaxy of ion‐implanted amorphous layers on 〈100〉 silicon

J. J. Grob and A. Grob
Journal of Applied Physics 62 (5) 1788 (1987)
https://doi.org/10.1063/1.339557