NUCLEAR SCATTERING MEASUREMENTS OF COMPOSITION PROFILES IN a-Si : H MULTILAYER STRUCTURES
J. Phys. Colloques, 42 C4 (1981) C4-795-C4-798
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Hydrogen content of amorphous silicon films deposited in a multipole plasma
B. Drevillon and M. ToulemondeJournal of Applied Physics 58 (1) 535 (1985)
https://doi.org/10.1063/1.335658