Articles citing this article

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Cited article:

Area selective PECVD on metal oxide resist

Rosanna A. Robert, Katie Lutker-Lee and Christophe Vallée
Journal of Vacuum Science & Technology A 43 (2) (2025)
https://doi.org/10.1116/6.0004072

Polycrystalline silicon carbide films deposited by low-power radio-frequency plasma decomposition of SiF4-CF4-H2 gas mixtures

Gautam Ganguly, Subal C. De, Swati Ray and A. K. Barua
Journal of Applied Physics 69 (7) 3915 (1991)
https://doi.org/10.1063/1.348450

Radiofrequency-plasma-deposited hydrogenated fluorinated silicon-carbon alloy films

Gautam Ganguly, Joydeep Dutta, Swati Ray and A. K. Barua
Physical Review B 40 (6) 3830 (1989)
https://doi.org/10.1103/PhysRevB.40.3830

Deposition of silicon films from SiCl4 glow discharges: A kinetic model of the surface process

G. Bruno, P. Capezzuto, G. Cicala and F. Cramarossa
Journal of Applied Physics 62 (5) 2050 (1987)
https://doi.org/10.1063/1.339548