CO2-LASER ANNEALING OF BURIED LAYERS PRODUCED BY MEV ION IMPLANTATION
J. Phys. Colloques, 41 C4 (1980) C4-47-C4-49
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CO2laser annealing of silicon
K. Naukkarinen, T. Tuomi, M. Blomberg, M. Luomajärvi and E. RauhalaJournal of Applied Physics 53 (8) 5634 (1982)
https://doi.org/10.1063/1.331446