| Issue |
J. Phys. Colloques
Volume 47, Number C7, Novembre 1986
33rd International Field Emission Symposium / 33ème Symposium International d'Emission de Champ
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| Page(s) | C7-157 - C7-160 | |
| DOI | https://doi.org/10.1051/jphyscol:1986728 | |
33rd International Field Emission Symposium / 33ème Symposium International d'Emission de Champ
J. Phys. Colloques 47 (1986) C7-157-C7-160
DOI: 10.1051/jphyscol:1986728
Institute of Metal Research, Academia Sinica, Shenyang, China
J. Phys. Colloques 47 (1986) C7-157-C7-160
DOI: 10.1051/jphyscol:1986728
THE INVESTIGATION OF FIELD ADSORPTION AND DIFFUSION OF HELIUM ON THE SURFACE OF TUNGSTEN BY AP-FIM
REN DA GANGInstitute of Metal Research, Academia Sinica, Shenyang, China
Abstract
This work was carried out with studies on the adsorption and diffusion of helium on the surface of tungsten by AP-FIM measurements and showed that helium is only adsorbed on the surface the W (001) and W (111) surface and that the binding energy of the field adsorption between helium and tungsten is 0.16 eV. The depth profile along the W [001] shows the depth of helium to be 40-50 atomic layers and the diffusion activation energy as 0.22 eV.