Issue
J. Phys. Colloques
Volume 42, Number C4, Octobre 1981
Proceedings of the Ninth International Conference on Amorphous and Liquid Semiconductors
Page(s) C4-639 - C4-642
DOI https://doi.org/10.1051/jphyscol:19814140
Proceedings of the Ninth International Conference on Amorphous and Liquid Semiconductors

J. Phys. Colloques 42 (1981) C4-639-C4-642

DOI: 10.1051/jphyscol:19814140

THETA-PINCH PLASMA HYDROGENATION OF EVAPORATED AMORPHOUS SILICON FILMS

P.K. John1, S.K. Wong1, P.K. Gogna1, B.Y. Tong1 and K.P. Chik2

1  University of Western Ontario, London, Ontario, Canada
2  The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, China


Abstract
Suitably prepared evaporated films are hydrogenated using a theta-pinch plasma source. The evaporated films become highly photoconducting after plasma treatment. The thus produced films do not exhibit the Staebler-Wronski instability and are highly stable against heat and moisture. Hydrogenation by theta-pinch plasma allows quantitative control of the amount and position of the introduced hydrogen. Film properties are more reproducible than those in glow-discharge methods.