| Issue |
J. Phys. Colloques
Volume 41, Number C9, Novembre 1980
Third International Symposium on Gas-Flow and Chemical Lasers
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|---|---|---|
| Page(s) | C9-243 - C9-249 | |
| DOI | https://doi.org/10.1051/jphyscol:1980932 | |
Third International Symposium on Gas-Flow and Chemical Lasers
J. Phys. Colloques 41 (1980) C9-243-C9-249
DOI: 10.1051/jphyscol:1980932
1 Department of Electrical Engineering, Keio University 3-14-1, Hiyoshi, Kohoku-ku, Yokohama-shi, 223, Japan.
2 Department of Electrical Engineering, Keio University, 3-14-1, Hiyoshi, Kohoku-ku, Yokohama-shi, 223, Japan.
J. Phys. Colloques 41 (1980) C9-243-C9-249
DOI: 10.1051/jphyscol:1980932
AN H2 (D2)/F2 CHEMICAL LASER INITIATED WITH A NOVEL TEFLON SURFACE SPARK UV FLASH
K. Watanabe1, Y. Sato2, C.H. Lee2, M. Obara2 et T. Fujioka21 Department of Electrical Engineering, Keio University 3-14-1, Hiyoshi, Kohoku-ku, Yokohama-shi, 223, Japan.
2 Department of Electrical Engineering, Keio University, 3-14-1, Hiyoshi, Kohoku-ku, Yokohama-shi, 223, Japan.
Abstract
The performance characteristics and the optimization parameters of a newly developed HF (DF) laser initiated by a novel surface spark UV flash using Teflon are presented. We have obtained an output energy of 0.65 J/pulse (11 J/1, 1.6 µsec FWHM) for HF laser, 0.25 J/pulse (4.2 J/1, 2.0 µsec FWHM) for DF laser with the improved maintenance of the light source. An intense short-pulse surface spark UV source driven by a coaxial Marx generator is realized experimentally in order to improve the power loading, efficiency, and lasing performances at higher operational gas pressure.