Issue
J. Phys. Colloques
Volume 41, Number C9, Novembre 1980
Third International Symposium on Gas-Flow and Chemical Lasers
Page(s) C9-51 - C9-57
DOI https://doi.org/10.1051/jphyscol:1980908
Third International Symposium on Gas-Flow and Chemical Lasers

J. Phys. Colloques 41 (1980) C9-51-C9-57

DOI: 10.1051/jphyscol:1980908

MODELING OF CW HF CHEMICAL LASERS WITH ROTATIONAL NONEQUILIBRIUM

Tien Tsai Yang

Rockwell International/Rocketdyne Division, 6633 Canoga Avenue, Canoga Park, California 91304, U.S.A.


Abstract
The simplified rotational relaxation time constant model of Hough, for pulsed chemical lasers, has been extended to CW diffusion chemical lasers to estimate the effect of rotational non-equilibrium on laser performance. The formulation was compared to experimental small signal gain, closed-cavity power, and spectral content. Effects of rotational relaxation rate on power extraction and spectral line distribution are predicted by numerical results of the present study. The dependence of rotational line shifting on mirror reflectivity has also been demonstrated.