Supplément au Journal de Physique Colloques

THE INFLUENCE OF X-RAY DAMAGE ON ELECTRON-INDUCED INTERFACE DEGRADATION IN MOS CAPACITORS

U. SCHWALKE, E.P. JACOBS and B. BREITHAUPT

J. Phys. Colloques, 49 C4 (1988) C4-299-C4-302

DOI: 10.1051/jphyscol:1988462

U. SCHWALKE

E.P. JACOBS

B. BREITHAUPT

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