DEVICE CHARACTERISATION OF A HIGH DENSITY HALF-MICRON CMOS PROCESS P.H. WOERLEE, C.A.H. JUFFERMANS, H. LIFKA, A.J. WALKER, T. POORTER, H.J.H. MERKS-EPPINGBROEK et F.M. OUDE LANSINK J. Phys. Colloques, 49 C4 (1988) C4-33-C4-36 DOI: 10.1051/jphyscol:1988405