MODELING OF LPCVD SILICON NITRIDE PROCESS JI-TAO WANG, SHI-LI ZHANG, YONG-FA WANG, WEI ZHANG, ZHENG-CHANG CHEN, KE-YUN ZHANG et YUAN-FANG WANGJ. Phys. Colloques, 50 C5 (1989) C5-67-C5-72DOI: https://doi.org/10.1051/jphyscol:1989511
