CONTROL OF A SELF-ALIGNED W SILICIDE PROCESS BY ANNEALING AMBIENCE J. TORRES, J. PALLEAU, N. BOURHILA, J. C. OBERLIN, A. DENEUVILLE et M. BENYAHIAJ. Phys. Colloques, 49 C4 (1988) C4-183-C4-186DOI: https://doi.org/10.1051/jphyscol:1988437
