NONSELECTIVE W/WSix -CVD TECHNOLOGY FOR LOW RESISTANCE VIA PLUGS ON ALUMINUM E. BERTAGNOLLI, C. WIECZOREK, B. HOFFMANN et H. SCHABERJ. Phys. Colloques, 49 C4 (1988) C4-179-C4-182DOI: https://doi.org/10.1051/jphyscol:1988436
