CMOS 1 MICRON ISOLATION TECHNOLOGY USING INTERFACE SEALING BY PLASMA NITRIDATION : PLASMA SILO P. DELPECH, B. VUILLERMOZ, M. BERENGUER, A. STRABONI et T. TERNISIENJ. Phys. Colloques, 49 C4 (1988) C4-529-C4-532DOI: https://doi.org/10.1051/jphyscol:19884110
