| Numéro |
J. Phys. Colloques
Volume 48, Numéro C6, Novembre 1987
34th International Field Emission Symposium / 34ème Symposium International d'Emission de Champ
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| Page(s) | C6-153 - C6-158 | |
| DOI | https://doi.org/10.1051/jphyscol:1987625 | |
J. Phys. Colloques 48 (1987) C6-153-C6-158
DOI: 10.1051/jphyscol:1987625
CHARACTERISTICS OF LIQUID METAL ION SOURCE FOR BORON AND ARSENIC
H. Fukuda1, K. Gamo2 et S. Namba21 Oki Electric Industry Co., Ltd, Hachioji Tokyo 193, Japan
2 Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560, Japan
Abstract
We have fabricated a liquid metal ion (LMI) source using Pd-Ni-As-B alloy which is useful for a direct ion implantation for silicon devices. Basic characteristics such as current-voltage characteristics, mass spectra and energy distribution have been measured. The ion source showed a threshold voltage of 5.0 keV for ionization, and the source current increased from 1 to 50 µA with increasing the extraction voltage from 5 to 10 keV. The mass spectra of this LMI source exhibited the ion ratio ; 1.2 % 10B+ , 2.3 % 11B+, 8.6 % 75As+ , 14.2 % 75As++ . The full width at half maximum of the energy distribution were typically ~ 10. eV for 11B+ , and ~15 eV for 75As++ ions at the source current of 15 µA. The present Pd-Ni-As-B alloy source was operated for more than 20 hours without change in the emission current and the mass spectra.