| Numéro |
J. Phys. Colloques
Volume 47, Numéro C7, Novembre 1986
33rd International Field Emission Symposium / 33ème Symposium International d'Emission de Champ
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|---|---|---|
| Page(s) | C7-3 - C7-6 | |
| DOI | https://doi.org/10.1051/jphyscol:1986701 | |
33rd International Field Emission Symposium / 33ème Symposium International d'Emission de Champ
J. Phys. Colloques 47 (1986) C7-3-C7-6
DOI: 10.1051/jphyscol:1986701
Department of Physics, Dalhousie University, Halifax, N. S. B3H3J5, Canada
J. Phys. Colloques 47 (1986) C7-3-C7-6
DOI: 10.1051/jphyscol:1986701
FIELD ADSORPTION AND EVAPORATION
H.J. KREUZER et K. NATHDepartment of Physics, Dalhousie University, Halifax, N. S. B3H3J5, Canada
Abstract
A microscopic tight-binding cluster model is used to calculate the field-induced adsorption of He on tungsten. Likewise field evaporation of tungsten ions is computed as a function of electric field strength. The importance of local field effects - here taken from self-consistent jellium calculations - is emphasized.