Numéro
J. Phys. Colloques
Volume 42, Numéro C4, Octobre 1981
Proceedings of the Ninth International Conference on Amorphous and Liquid Semiconductors
Page(s) C4-1037 - C4-1040
DOI https://doi.org/10.1051/jphyscol:19814227
Proceedings of the Ninth International Conference on Amorphous and Liquid Semiconductors

J. Phys. Colloques 42 (1981) C4-1037-C4-1040

DOI: 10.1051/jphyscol:19814227

PHOTOCONDUCTIVITY IN a-Si : H AND a-SixC1-x : H, CORRELATION WITH PHOTOLUMINESCENCE RESULTS

D. Caffier, M. Le Contellec and J. Richard

CNET, Centre Lannion B, ROC/TIC, 22301 Lannion, France


Abstract
Photoconductivity and photoluminescence of a-Si : H and a-SixC1-x : H films prepared by glow discharge or R.F sputtering have been studied. For a-Si : H sputtered films, the photoconductivity is greatly increased with R.F power, substrate temperature and can be compared to values obtained for glow discharge films. The addition of a low carbon content (< 10 %) does not affect the photoconductivity but a higher content greatly decreases it. In conclusion, we deduced that the existence of a high 1.2 eV photoluminescence peak is a necessary condition to obtain a good photoconductivity.