36th International Field Emission Symposium
J. Phys. Colloques 50 (1989) C8-179-C8-190
DOI: 10.1051/jphyscol:1989832
FOCUSED ION BEAMS IN MICROFABRICATION
P.D. PREWETTLithography Division, Rutherford Appleton Laboratory, Chilton, Didcot, Oxon, Great-Britain
Abstract
Focused ion beams, generated from high intensity liquid metal field emission ion sources, can be used both for machining and deposition. Their potential applications in microfabrication of semiconductor microcircuits range from mask and integrated circuit repair to lithography and direct write ion implantation doping.