FAST PLASMA DEPOSITION OF CARBON AND SILICON LAYERS J.J. BEULENS, A.J.M. BUURON, L.A. BISSCHOPS, T.H.J. BISSCHOPS, A.B.M. HUSKEN, G.M.W. KROESEN, G.J. MEEUSEN, C.J. TIMMERMANS, A.T.M. WILBERS et D.C. SCHRAM J. Phys. Colloques, 51 C5 (1990) C5-361-C5-367 DOI: 10.1051/jphyscol:1990543