Supplément au Journal de Physique Colloques

HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

DING-KUN PENG, CHUN-LIN WANG and GUANG-YAO MENG

J. Phys. Colloques, 50 C5 (1989) C5-667-C5-672

DOI: 10.1051/jphyscol:1989578

DING-KUN PENG

CHUN-LIN WANG

GUANG-YAO MENG

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