Supplément au Journal de Physique Colloques

CHARACTERIZATION OF INTRINSIC STRESSES OF PECVD SILICON NITRIDE FILMS DEPOSITED IN A HOT-WALL REACTOR

K. AITE, R. KOEKOEK, J. HOLLEMAN and J. MIDDELHOEK

J. Phys. Colloques, 50 C5 (1989) C5-323-C5-331

DOI: 10.1051/jphyscol:1989539

K. AITE

R. KOEKOEK

J. HOLLEMAN

J. MIDDELHOEK

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