Supplément au Journal de Physique Colloques

A MATHEMATICAL MODEL OF THE SILICON CHEMICAL VAPOR DEPOSITION IN A ATMOSPHERIC PRESSURE COLD-WALL REACTOR

Y.J. PARK, G.J. MIN, Y.W. PARK, C.O. PARK and J.S. CHUN

J. Phys. Colloques, 50 C5 (1989) C5-45

DOI: 10.1051/jphyscol:1989508

Y.J. PARK

G.J. MIN

Y.W. PARK

C.O. PARK

J.S. CHUN

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