Supplément au Journal de Physique Colloques

CMOS 1 MICRON ISOLATION TECHNOLOGY USING INTERFACE SEALING BY PLASMA NITRIDATION : PLASMA SILO

P. DELPECH, B. VUILLERMOZ, M. BERENGUER, A. STRABONI and T. TERNISIEN

J. Phys. Colloques, 49 C4 (1988) C4-529-C4-532

DOI: 10.1051/jphyscol:19884110

P. DELPECH

B. VUILLERMOZ

M. BERENGUER

A. STRABONI

T. TERNISIEN

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