PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO2 FILMS FROM TEOS LIQUID SOURCE S. ROJAS, P. SERRA, W. S. WU, F. SANTARELLI, G. C. SARTI et F. MINNIJ. Phys. Colloques, 50 C5 (1989) C5-83-C5-90DOI: https://doi.org/10.1051/jphyscol:1989513
