GROWTH OF THIN SINGLE CRYSTAL NiSi2 FILMS OF Si SURFACES, A FIELD ION MICROSCOPE STUDY H. F. LIU, H. M. LIU et T. T. TSONGJ. Phys. Colloques, 47 C2 (1986) C2-315-C2-319DOI: https://doi.org/10.1051/jphyscol:1986248
