STRUCTURAL AND ELECTRONIC PROPERTIES OF CVD SILICON FILMS NEAR THE CRYSTALLIZATION TEMPERATURE J. Magariño, D. Kaplan, R. Bisaro, J. F. Morhange et K. ZellamaJ. Phys. Colloques, 43 C1 (1982) C1-271-C1-276DOI: https://doi.org/10.1051/jphyscol:1982137
