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Glow-discharge amorphous silicon: Growth process and structure

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Materials Science Reports 2 (4) 139 (1987)
DOI: 10.1016/S0920-2307(87)80003-8
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Fine particle removal by a negatively-charged fine particle collector in silane plasma

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Thin Solid Films 457 (2) 285 (2004)
DOI: 10.1016/j.tsf.2003.11.300
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Experimental and full multiple scattering approaches to energy-loss near-edge structures (ELNES) for c-Si, a-Si and a-Si:H

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Chemical Physics Letters 371 (3-4) 498 (2003)
DOI: 10.1016/S0009-2614(03)00308-7
Voir cet article

Fluorine-incorporation scheme in fluorinated amorphous silicon prepared by various methods

Minoru Kumeda, Yukio Takahashi and Tatsuo Shimizu
Physical Review B 36 (5) 2713 (1987)
DOI: 10.1103/PhysRevB.36.2713
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Mechanism of surface reaction in the deposition process ofa-Si:H by rf glow discharge

Keiji Maeda, Atsushi Kuroe and Ikurou Umezu
Physical Review B 51 (16) 10635 (1995)
DOI: 10.1103/PhysRevB.51.10635
Voir cet article

Difference in light‐induced annealing behavior of deposition‐ and light‐induced defects in hydrogenated amorphous silicon

N. Hata and A. Matsuda
Applied Physics Letters 63 (14) 1948 (1993)
DOI: 10.1063/1.110610
Voir cet article

Infrared investigations of hydrogenated amorphous silicon. II. The existence of polysilane, (SiH2)n

E. Sacher
Philosophical Magazine B 51 (3) 295 (1985)
DOI: 10.1080/13642818508240575
Voir cet article

Plasma polymerization and deposition of amorphous hydrogenated silicon from rf and dc silane plasmas

R. C. Ross and J. Jaklik
Journal of Applied Physics 55 (10) 3785 (1984)
DOI: 10.1063/1.332935
Voir cet article

Defect formation during deposition of undoped a-Si:H by rf glow discharge

Keiji Maeda, Ikurou Umezu and Hotaka Ishizuka
Physical Review B 55 (7) 4323 (1997)
DOI: 10.1103/PhysRevB.55.4323
Voir cet article

Springer Handbook of Electronic and Photonic Materials

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Springer Handbook of Electronic and Photonic Materials 1 (2017)
DOI: 10.1007/978-3-319-48933-9_24
Voir cet article

Molecular Dynamics Simulation of Hydrogenated Amorphous Silicon with Tersoff Potential

Tatsuya Ohira, Takaji Inamuro and Takeshi Adachi
MRS Proceedings 336 177 (1994)
DOI: 10.1557/PROC-336-177
Voir cet article

digital Encyclopedia of Applied Physics

S. R. Elliott
digital Encyclopedia of Applied Physics (2003)
DOI: 10.1002/3527600434.eap019
Voir cet article

Investigation of the bubble formation mechanism in a-Si:H films by Fourier-transform infrared microspectroscopy

Y. Mishima and T. Yagishita
Journal of Applied Physics 64 (8) 3972 (1988)
DOI: 10.1063/1.341355
Voir cet article

The structure of amorphous hydrogenated silicon and its alloys: A review

S.R. Elliott
Advances in Physics 38 (1) 1 (1989)
DOI: 10.1080/00018738900101092
Voir cet article

A structural model of hydrogenated amorphous silicon

V. Drchal and J. Málek
Philosophical Magazine B 62 (3) 271 (1990)
DOI: 10.1080/13642819008208630
Voir cet article

Ternary Compounds, Organic Semiconductors

Landolt-Börnstein - Group III Condensed Matter, Ternary Compounds, Organic Semiconductors 41E 1 (2000)
DOI: 10.1007/10717201_920
Voir cet article

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Kazuo Morigaki and Chisato Ogihara
Springer Handbook of Electronic and Photonic Materials 565 (2006)
DOI: 10.1007/978-0-387-29185-7_25
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