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FAST PLASMA DEPOSITION OF CARBON AND SILICON LAYERS

J.J. BEULENS, A.J.M. BUURON, L.A. BISSCHOPS, T.H.J. BISSCHOPS, A.B.M. HUSKEN, G.M.W. KROESEN, G.J. MEEUSEN, C.J. TIMMERMANS, A.T.M. WILBERS and D.C. SCHRAM
J. Phys. Colloques, 51 C5 (1990) C5-361-C5-367
DOI: 10.1051/jphyscol:1990543

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